 | | Surface cleaning.
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 | | Particulate and ionic contamination.
|
 | | Particle adhesion and removal on semiconductor, metallic and polymer substrates.
|
 | | Microcontamination in CVD and PVD systems.
|
 | | Physical modeling of contaminant transport and removal in CVD, PVD and wet processes.
|
 | | Process control and quality in CVD, PVD and electroplating processes
|
 | | Megasonic cleaning.
|
 | | Ultrasonic cleaning.
|
 | | Contact (Brush) cleaning.
|
 | | Post-CMP cleaning of W, Cu and Oxide films.
|
 | | Airborne contamination in clean environments.
|
 | | Physical modeling of airflow and particle transport and deposition in clean environments. |
| | |